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CAIRO BOOKS's Description
There are many different vapor phase surface treatments of materials that can
be used to produce a wide variety of end results, but each of them are of
increasing importance in the pursuit of high performance advanced materials.
These techniques differ significantly in the physical or chemical nature of the
gas–surface interactions involved, and also in the thickness and morphology of
the coatings produced.
Applications include advanced semiconductors, optics, and nanotechnology, as
well as many more. This book details the most important techniques used in
industrial applications, providing coverage from the basic physics to the
technical details of each, with emphasis on the macroscopic engineering of the
processes and the microscopic characterization of the produced coatings.
Vacuum evaporation, cathodic sputtering and ion implantation produce thin
films mainly by physical interactions; gas cementation, nitridation,
carbonitridation and pack cementation produce thicker surface modifications
involving chemical reactions. A section of the book is devoted to chemical
vapor deposition (CVD) processes, with dedicated chapters dealing with i)
principles and industrial applications, ii) the use of plasma and lasers to
assist deposition, and iii) macroscopic modeling of reactors. Alain Galerie has
drawn contributions from leading experts at top research universities to
produce a complete overview of the vapor phase surface treatments which have an
increasing role in modern surface engineering.
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