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CAIRO BOOKS's Description
Cutting-Edge CMOS VLSI Design for Manufacturability Techniques
This detailed guide offers proven methods for optimizing circuit designs to
increase the yield, reliability, and manufacturability of products and mitigate
defects and failure. Covering the latest devices, technologies, and processes,
Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on
delivering higher performance and lower power consumption. Costs, constraints,
and computational efficiencies are also discussed in the practical resource.
Nanoscale CMOS VLSI Circuits covers: Current trends in CMOS VLSI design
Semiconductor manufacturing technologies Photolithography Process and device
variability: analyses and modeling Manufacturing-Aware Physical Design Closure
Metrology, manufacturing defects, and defect extraction Defect impact modeling
and yield improvement techniques Physical design and reliability DFM tools and